Time: 9am to 12.30pm Venue: Seminar Room 1, Level 1, Institute of Materials Research and Engineering (IMRE), 3 Research Link, Singapore 117602
The first Industry Forum on Nanoimprint Lithography (NIL) was jointly organised by the Institute of Materials Research and Engineering (IMRE)and Exploit Technologies Pte Ltd (ETPL) on 30th March 2007. A total of 8 presentations covering the entire value chain of NIL were shared by local and international speakers from research institutions and industrial representatives. We have received much positive feedback from this event, and so we have organized the 2nd Industry Forum on NIL. This year, the theme of the Forum is on the Applications of NIL.
Originally, the development of NIL was directed mostly toward Applications in the semiconductor and patterned media industries. Additionally, in the past few years NIL has also been quickly adapted toward a wide range of Applications such as optical components, printed electronics, as well as chemical and biomedical components and devices.
Programme:
09:00 am Registration
09:20 am Opening address
..........................Prof Chua Soo Jin
..........................Deputy Executive Director, (Industry),IMRE
09:30 am Nanoimprinting-Is it finally taking off? "Making invisible contributions"
..........................Ms Radiana Soh
..........................AVP, ETPL
09:40 am Updated Activities of NIL Working Group
..........................Dr Low Hong Yee
..........................Research Scientist, IMRE
10:00 am Application Specific NIL Stamp Fabrication
..........................T.Nielson
..........................CEO,NIL Technology ApS (Denmark)
10:30 am Tea-Break and Networking
11:00 am Imprint Lithography Applications in Hard Disk Drive Manufacturing
..........................Mark Melliar-Smith
..........................CEO,Molecular Imprints, (USA)
11:30 am Polymer-dispersed Liquid Crystal Devices
..........................A/P Sun Xiao Wei
..........................Nanyang Technological University (Singapore)
12:00 pm Imprinting of TiO2
..........................Dr M.S. Saifullah
..........................Research Scientist, IMRE
12:30 pm End of Forum
Venue: Seminar Room 1, Level 1, Institute of Materials Research and Engineering (IMRE), 3 Research Link, Singapore 117602
Start Date: 07 May 2008
End Date: 07 May 2008
Time: 9am to 12.30pm
Pre-registration for the industry forum is necessary. All are welcome.